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Modeling of Chemical Vapor Deposition of Tungsten Films
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SchnittFr. 86.61 ( 79.79)¹ Fr. 100.99 ( 93.04)¹ Fr. 84.19 ( 77.57)¹ Fr. 92.90 ( 85.59)¹ Fr. 65.58 ( 60.42)¹
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9783034877435 - Chris R. Kleijn, Christoph Werner: Modeling of Chemical Vapor Deposition of Tungsten Films
1
Chris R. Kleijn, Christoph Werner (?):

Modeling of Chemical Vapor Deposition of Tungsten Films (?)

ISBN: 9783034877435 (?) bzw. 3034877439, in Deutsch, Springer-Verlag/Sci-Tech/Trade, neu

Fr. 76.92 (C$ 107.02)¹(unverbindlich)
Lagernd, zzgl. Versandkosten
Von Händler/Antiquariat
Chris R. Kleijn, Christoph Werner, Books, Science and Nature, Modeling of Chemical Vapor Deposition of Tungsten Films, Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per­ formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
9783034877435 - Kleijn, Chris R. / Werner, Christoph: Modeling of Chemical Vapor Deposition of Tungsten Films
2
Kleijn, Chris R. / Werner, Christoph (?):

Modeling of Chemical Vapor Deposition of Tungsten Films (?)

ISBN: 9783034877435 (?) bzw. 3034877439, in Deutsch, Springer Basel

Fr. 77.35 ($ 80.25)¹(versandkostenfrei, unverbindlich)
Lagernd
Von Händler/Antiquariat
Modeling of Chemical Vapor Deposition of Tungsten Films Kleijn, Chris R. / Werner, Christoph, Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects."
9783034877435 - Kleijn, Chris R. Werner, Christoph: Modeling of Chemical Vapor Deposition of Tungsten Films
3
Kleijn, Chris R. Werner, Christoph (?):

Modeling of Chemical Vapor Deposition of Tungsten Films (?)

ISBN: 9783034877435 (?) bzw. 3034877439, in Deutsch, Birkhäuser, Taschenbuch, neu

Fr. 78.09 ( 71.95)¹(versandkostenfrei, unverbindlich)
Versandkostenfrei
buecher.de GmbH & Co. KG, [1]
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.Softcover reprint of the original 1st ed. 1993. 2013. 139 S. 139 p. 229 mmVersandfertig in 3-5 Tagen, Softcover
9783034877435 - Chris R. Kleijn; Christoph Werner: Modeling of Chemical Vapor Deposition of Tungsten Films
4
Chris R. Kleijn; Christoph Werner (?):

Modeling of Chemical Vapor Deposition of Tungsten Films (?)

ISBN: 9783034877435 (?) bzw. 3034877439, in Deutsch, Springer Shop, Taschenbuch, neu

Fr. 53.00 ($ 54.99)¹(unverbindlich)
Lagernd, zzgl. Versandkosten
Von Händler/Antiquariat
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per­ formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects. Soft cover
9783034877435 - Modeling of Chemical Vapor Deposition of Tungsten Films
5

Modeling of Chemical Vapor Deposition of Tungsten Films (2013) (?)

ISBN: 9783034877435 (?) bzw. 3034877439, in Deutsch, Taschenbuch, neu, Nachdruck

Fr. 69.45 ( 63.99)¹(versandkostenfrei, unverbindlich)
Next Day, Versandkostenfrei
Von Händler/Antiquariat
Erscheinungsdatum: 20.11.2013, Medium: Taschenbuch, Einband: Kartoniert / Broschiert, Titel: Modeling of Chemical Vapor Deposition of Tungsten Films, Auflage: Softcover reprint of the original 1st ed. 1993, Autor: Kleijn, Chris R. // Werner, Christoph, Verlag: Birkhäuser Basel // Springer Basel, Sprache: Englisch, Rubrik: Geisteswissenschaften allgemein, Seiten: 140, Informationen: Book, Gewicht: 213 gr, Verkäufer: averdo
9783034877435 - Chris R. Kleijn, Christoph Werner: Modeling of Chemical Vapor Deposition of Tungsten Films
6
Chris R. Kleijn, Christoph Werner (?):

Modeling of Chemical Vapor Deposition of Tungsten Films (?)

ISBN: 9783034877435 (?) bzw. 3034877439, in Deutsch, Birkhauser Basel, Birkhauser Basel, Birkhauser Basel, Taschenbuch, gebraucht

Fr. 90.28 ($ 93.28)¹(unverbindlich)
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Von Händler/Antiquariat
Chris R. Kleijn, Christoph Werner, Paperback - Softcover reprint of the original 1st ed. 1993,Series: Progress in Numerical Simulation for Microelectronics Series, English-language edition, Pub by Birkhauser Basel
9783034877435 - Chris R. Kleijn: Modeling of Chemical Vapor Deposition of Tungsten Films
7
Chris R. Kleijn (?):

Modeling of Chemical Vapor Deposition of Tungsten Films (?)

ISBN: 9783034877435 (?) bzw. 3034877439, in Deutsch, Birkhäuser Basel, Taschenbuch, neu

Fr. 77.10 ($ 79.99)¹(unverbindlich)
Lagernd, zzgl. Versandkosten
Von Händler/Antiquariat
Modeling-of-Chemical-Vapor-Deposition-of-Tungsten-Films~~Chris-R-Kleijn, Modeling of Chemical Vapor Deposition of Tungsten Films, Paperback
9783034877435 - Kleijn, Chris R;Werner, Christoph: Modeling of Chemical Vapor Deposition of Tungsten Films
8
Kleijn, Chris R;Werner, Christoph (?):

Modeling of Chemical Vapor Deposition of Tungsten Films (?)

ISBN: 9783034877435 (?) bzw. 3034877439, in Deutsch, Taschenbuch, neu

Fr. 92.90 ( 85.59)¹(versandkostenfrei, unverbindlich)
Versandkosten, 3034877439
Von Händler/Antiquariat
Softcover reprint of the original 1st ed. 1993. Softcover reprint of the original 1st ed. 1993.