Modeling of Chemical Vapor Deposition of Tungsten Films (Progress in Numerical Simulation for Microelectronics)
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9780817628581 - Chris R. Kleijn, Christoph Werner: Modeling of Chemical Vapor Deposition of Tungsten Films (Progress in Numerical Simulation for Microelectronics)
Chris R. Kleijn, Christoph Werner

Modeling of Chemical Vapor Deposition of Tungsten Films (Progress in Numerical Simulation for Microelectronics) (1993)

Lieferung erfolgt aus/von: Vereinigte Staaten von Amerika EN HC NW

ISBN: 9780817628581 bzw. 0817628584, in Englisch, 126 Seiten, Birkhauser, gebundenes Buch, neu.

Fr. 45.23 ($ 49.50)¹ + Versand: Fr. 3.65 ($ 3.99)¹ = Fr. 48.88 ($ 53.49)¹
unverbindlich
Lieferung aus: Vereinigte Staaten von Amerika, Usually ships in 1-2 business days.
Von Händler/Antiquariat, scholarsattic.
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per­ formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects. Hardcover, Label: Birkhauser, Birkhauser, Produktgruppe: Book, Publiziert: 1993-03-25, Studio: Birkhauser, Verkaufsrang: 14053667.
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9780817628581 - Chris R. Kleijn, Christoph Werner: Modeling of Chemical Vapor Deposition of Tungsten Films (Progress in Numerical Simulation for Microelectronics)
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Chris R. Kleijn, Christoph Werner

Modeling of Chemical Vapor Deposition of Tungsten Films (Progress in Numerical Simulation for Microelectronics) (1993)

Lieferung erfolgt aus/von: Vereinigte Staaten von Amerika EN HC

ISBN: 9780817628581 bzw. 0817628584, in Englisch, Birkhauser, gebundenes Buch.

Fr. 62.03 ($ 67.88)¹ + Versand: Fr. 3.65 ($ 3.99)¹ = Fr. 65.67 ($ 71.87)¹
unverbindlich
Lieferung aus: Vereinigte Staaten von Amerika, Versandkosten nach: USA.
Von Händler/Antiquariat, Ergodebooks.
Birkhauser, 1993-03-25. Hardcover. Used:Good. Buy with confidence. Excellent Customer Service & Return policy. Ships Fast. 24*7 Customer Service.
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9780817628581 - Kleijn, Chris R, and Werner, C: Modeling of Chemical Vapor Deposition of Tungsten Films
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Kleijn, Chris R, and Werner, C

Modeling of Chemical Vapor Deposition of Tungsten Films (1993)

Lieferung erfolgt aus/von: Indien EN HC NW

ISBN: 9780817628581 bzw. 0817628584, in Englisch, Birkhauser, gebundenes Buch, neu.

Fr. 79.94 ($ 87.48)¹
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Lieferung aus: Indien, zzgl. Versandkosten, Verandgebiet: INT.
Von Händler/Antiquariat, DELHI BOOK STORE, DELHI, NEW DELHI, [RE:5].
Hard cover, Illustrated.
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9780817628581 - Kleijn, Chris R.; Werner, Christoph: Modeling of Chemical Vapor Deposition of Tungsten Films (Progress in Numerical Simulation for Microelectronics)
Symbolbild
Kleijn, Chris R.; Werner, Christoph

Modeling of Chemical Vapor Deposition of Tungsten Films (Progress in Numerical Simulation for Microelectronics) (1993)

Lieferung erfolgt aus/von: Vereinigte Staaten von Amerika EN HC NW

ISBN: 9780817628581 bzw. 0817628584, in Englisch, Birkhauser, gebundenes Buch, neu.

Fr. 70.88 ($ 77.56)¹
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Lieferung aus: Vereinigte Staaten von Amerika, Versandkostenfrei.
Von Händler/Antiquariat, Irish Booksellers [57531671], Rumford, ME, U.S.A.
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9780817628581 - Werner Christoph: Modeling of Chemical Vapor Deposition of Tungsten Films
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Werner Christoph

Modeling of Chemical Vapor Deposition of Tungsten Films (1993)

Lieferung erfolgt aus/von: Indien EN HC NW

ISBN: 9780817628581 bzw. 0817628584, in Englisch, Springer, gebundenes Buch, neu.

Fr. 90.43 ($ 98.97)¹
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Lieferung aus: Indien, zzgl. Versandkosten, Verandgebiet: INT.
Von Händler/Antiquariat, Bestdealsbooks, DELHI, NEW DELHI, [RE:3].
HARDBACK, Illustrated.
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