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100%: Seongbo Shim, Youngsoo Shin: Physical Design and Mask Synthesis for Directed Self-Assembly Lithography (ISBN: 9783319762944) 2018, Erstausgabe, in Englisch, Taschenbuch.Nur diese Ausgabe anzeigen…
80%: Seongbo Shim, Mitwirkende: Youngsoo Shin: Physical Design and Mask Synthesis for Directed Self-Assembly Lithography (NanoScience and Technology) (ISBN: 9783030094553) 2019, in Englisch, Taschenbuch.Nur diese Ausgabe anzeigen…
67%: Seongbo Shim: Physical Design and Mask Synthesis for Directed Self-Assembly Lithography als von Youngsoo Shin (ISBN: 9783319762937) 2018, Springer International Publishing, in Deutsch, Broschiert.Nur diese Ausgabe anzeigen…
Physical Design and Mask Synthesis for Directed Self-Assembly Lithography
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Bester Preis: Fr. 4.97 (€ 5.08)¹ (vom 05.08.2019)1
Physical Design Mask Synthesis for Directed Self-Assembly Lithography
EN EBISBN: 9783319762944 bzw. 331976294X, in Englisch, Vitalsource Technologies, Inc. E-Book.
Lieferung aus: Vereinigte Staaten von Amerika, Lagernd, zzgl. Versandkosten.
9783319762944,331976294x,physical,design,mask,synthesis,shim, A digital copy of "Physical Design and Mask Synthesis for Directed Self-Assembly Lithography" by Seongbo Shim and Youngsoo Shin. Download is immediately available upon purchase! eBook, Format: VitalSource. Type: . Copying: Allowed, .2Â.36 selections may be copied every 2Â.365 days. Printable: Allowed, .2Â.36 prints for 2Â.365 days. Expires: No Expiration. Read Aloud?: Allowed. Sharing: Not Allowed. Software: Online: No additional software required Offline: VitalSource Bookshelf. Shipping to USA only!
9783319762944,331976294x,physical,design,mask,synthesis,shim, A digital copy of "Physical Design and Mask Synthesis for Directed Self-Assembly Lithography" by Seongbo Shim and Youngsoo Shin. Download is immediately available upon purchase! eBook, Format: VitalSource. Type: . Copying: Allowed, .2Â.36 selections may be copied every 2Â.365 days. Printable: Allowed, .2Â.36 prints for 2Â.365 days. Expires: No Expiration. Read Aloud?: Allowed. Sharing: Not Allowed. Software: Online: No additional software required Offline: VitalSource Bookshelf. Shipping to USA only!
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Physical Design and Mask Synthesis for Directed Self-Assembly Lithography (2019)
DE NW RPISBN: 9783030094553 bzw. 3030094553, in Deutsch, Springer, neu, Nachdruck.
Von Händler/Antiquariat, Paperbackshop-US [8408184], Wood Dale, IL, U.S.A.
New Book. Shipped from US within 10 to 14 business days. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000.
New Book. Shipped from US within 10 to 14 business days. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000.
3
Symbolbild
Physical Design and Mask Synthesis for Directed Self-Assembly Lithography (2019)
DE NW RPISBN: 9783030094553 bzw. 3030094553, in Deutsch, Springer, neu, Nachdruck.
Von Händler/Antiquariat, Books2Anywhere [190245], Fairford, GLOS, United Kingdom.
New Book. Delivered from our UK warehouse in 4 to 14 business days. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000.
New Book. Delivered from our UK warehouse in 4 to 14 business days. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000.
4
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Physical Design and Mask Synthesis for Directed Self-Assembly Lithography (Paperback) (2019)
DE PB NWISBN: 9783030094553 bzw. 3030094553, in Deutsch, Springer, United States, Taschenbuch, neu.
Von Händler/Antiquariat, The Book Depository EURO [60485773], London, United Kingdom.
Language: English. Brand new Book. This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
Language: English. Brand new Book. This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
5
Physical Design and Mask Synthesis for Directed Self-Assembly Lithography (NanoScience and Technology) (2018)
EN NW FE EB DLISBN: 9783319762944 bzw. 331976294X, in Englisch, 138 Seiten, Springer, neu, Erstausgabe, E-Book, elektronischer Download.
Lieferung aus: Vereinigte Staaten von Amerika, E-Book zum Download, Versandkostenfrei.
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology., Kindle Edition, Ausgabe: 1st ed. 2018, Format: Kindle eBook, Label: Springer, Springer, Produktgruppe: eBooks, Publiziert: 2018-03-21, Freigegeben: 2018-03-21, Studio: Springer.
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology., Kindle Edition, Ausgabe: 1st ed. 2018, Format: Kindle eBook, Label: Springer, Springer, Produktgruppe: eBooks, Publiziert: 2018-03-21, Freigegeben: 2018-03-21, Studio: Springer.
6
Physical Design and Mask Synthesis for Directed Self-Assembly Lithography (2018)
DE NWISBN: 9783319762944 bzw. 331976294X, in Deutsch, Springer, neu.
Lieferung aus: Niederlande, Direct beschikbaar.
bol.com.
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology. This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology. Inhoud:Taal: Engelstalig;EAN: 9783319762944;Bindwijze: E-book;Verschijningsdatum: 2018-03-21; Betrokkenen:Auteur: Seongbo Shim | Youngsoo Shin; Engelstalig | E-book | 9783319762944.
bol.com.
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology. This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology. Inhoud:Taal: Engelstalig;EAN: 9783319762944;Bindwijze: E-book;Verschijningsdatum: 2018-03-21; Betrokkenen:Auteur: Seongbo Shim | Youngsoo Shin; Engelstalig | E-book | 9783319762944.
7
Physical Design and Mask Synthesis for Directed Self-Assembly Lithography
~EN NW EB DLISBN: 9783319762944 bzw. 331976294X, vermutlich in Englisch, Springer Shop, neu, E-Book, elektronischer Download.
Lieferung aus: Österreich, Lagernd, zzgl. Versandkosten.
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology. eBook.
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology. eBook.
8
Physical Design and Mask Synthesis for Directed Self-Assembly Lithography (2018)
EN NW EB DLISBN: 9783319762944 bzw. 331976294X, in Englisch, Springer, Springer, Springer, neu, E-Book, elektronischer Download.
Lieferung aus: Kanada, in-stock.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
9
Physical Design and Mask Synthesis for Directed Self-Assembly Lithography
~EN PB NWISBN: 9783319762944 bzw. 331976294X, vermutlich in Englisch, Springer-Verlag GmbH, Taschenbuch, neu.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
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