Nanolithography: A Borderland Between Stm, Eb, Ib, And X-Ray Lithographies (Nato Science Series E: (Closed)
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Bester Preis: Fr. 43.00 (€ 43.97)¹ (vom 08.03.2017)1
Nanolithography: A Borderland Between Stm, Eb, Ib, And X-Ray Lithographies (Nato Science Series E: (Closed) (2010)
EN PB NWISBN: 9789048143887 bzw. 9048143888, in Englisch, 228 Seiten, Springer, Taschenbuch, neu.
Lieferung aus: Vereinigtes Königreich Grossbritannien und Nordirland, Usually dispatched within 1-2 business days, exclusief verzendkosten (indien geleverd).
Von Händler/Antiquariat, Nearfine.
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL). Paperback, Editie: Softcover reprint of hardcover 1st ed. 1994, Label: Springer, Springer, Productgroep: Book, Gepubliceerd: 2010-12-05, Releasedatum: 2010-12-05, Studio: Springer.
Von Händler/Antiquariat, Nearfine.
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL). Paperback, Editie: Softcover reprint of hardcover 1st ed. 1994, Label: Springer, Springer, Productgroep: Book, Gepubliceerd: 2010-12-05, Releasedatum: 2010-12-05, Studio: Springer.
2
Nanolithography: A Borderland Between Stm, Eb, Ib, And X-Ray Lithographies (Nato Science Series E: (Closed) (2010)
EN PB USISBN: 9789048143887 bzw. 9048143888, in Englisch, 228 Seiten, Springer, Taschenbuch, gebraucht.
Lieferung aus: Vereinigtes Königreich Grossbritannien und Nordirland, Usually dispatched within 1-2 business days, exclusief verzendkosten (indien geleverd).
Von Händler/Antiquariat, ShineWood.
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL). Paperback, Editie: Softcover reprint of hardcover 1st ed. 1994, Label: Springer, Springer, Productgroep: Book, Gepubliceerd: 2010-12-05, Releasedatum: 2010-12-05, Studio: Springer.
Von Händler/Antiquariat, ShineWood.
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL). Paperback, Editie: Softcover reprint of hardcover 1st ed. 1994, Label: Springer, Springer, Productgroep: Book, Gepubliceerd: 2010-12-05, Releasedatum: 2010-12-05, Studio: Springer.
3
Nanolithography, a Borderland Between STM, EB, IB, and X-ray Lithographies (2010)
NL PB NWISBN: 9789048143887 bzw. 9048143888, in Holländisch, Springer, Taschenbuch, neu.
Lieferung aus: Niederlande, 5-10 werkdagen.
bol.com.
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).Taal: Engels;Afmetingen: 12x235x155 mm;Gewicht: 355,00 gram;Verschijningsdatum: december 2010;ISBN10: 9048143888;ISBN13: 9789048143887; Engelstalig | Paperback | 2010.
bol.com.
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).Taal: Engels;Afmetingen: 12x235x155 mm;Gewicht: 355,00 gram;Verschijningsdatum: december 2010;ISBN10: 9048143888;ISBN13: 9789048143887; Engelstalig | Paperback | 2010.
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Poetarum Elegiacorum Testimonia et Fragmenta, pars prior (Bibliotheca scriptorum Graecorum et Romanorum Teubneriana) (1998)
EN HC USISBN: 9783598717017 bzw. 3598717016, in Englisch, 296 Seiten, 2. Ausgabe, K.G. SAUR VERLAG, gebundenes Buch, gebraucht.
Neu ab: $93.88 (10 Angebote)
Gebraucht ab: $96.62 (5 Angebote)
Zu den weiteren 15 Angeboten bei Amazon.com
Lieferung aus: Vereinigte Staaten von Amerika, Usually ships in 1-2 business days.
Von Händler/Antiquariat, tabletopart.
Written primarily in Greek, 1988 edition. , Hardcover, Ausgabe: 2nd, Label: K.G. SAUR VERLAG, K.G. SAUR VERLAG, Produktgruppe: Book, Publiziert: 1998-09-15, Studio: K.G. SAUR VERLAG, Verkaufsrang: 8942481.
Von Händler/Antiquariat, tabletopart.
Written primarily in Greek, 1988 edition. , Hardcover, Ausgabe: 2nd, Label: K.G. SAUR VERLAG, K.G. SAUR VERLAG, Produktgruppe: Book, Publiziert: 1998-09-15, Studio: K.G. SAUR VERLAG, Verkaufsrang: 8942481.
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Poetae elegiaci. Testimonia et fragmenta: Pars I (Bibliotheca Scriptorum Graecorum Et Romanorum Teubneriana) (1998)
EN HC NWISBN: 9783598717017 bzw. 3598717016, in Englisch, 247 Seiten, 2. Ausgabe, De Gruyter, gebundenes Buch, neu.
Neu ab: EUR 79,95 (5 Angebote)
Gebraucht ab: EUR 290,32 (1 Angebote)
Zu den weiteren 6 Angeboten bei Amazon.de (Int.)
Lieferung aus: Deutschland, Gewöhnlich versandfertig in 24 Stunden.
Von Händler/Antiquariat, Amazon.de.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
Von Händler/Antiquariat, Amazon.de.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
6
Poetarum elegiacorum testimonia et fragmenta (Bibliotheca Teubneriana) (1988)
EN NWISBN: 9783598717017 bzw. 3598717016, in Englisch, 296 Seiten, 2. Ausgabe, De Gruyter, neu.
Lieferung aus: Spanien, Normalmente se despacha en 24 horas.
Von Händler/Antiquariat, Amazon.es.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
Von Händler/Antiquariat, Amazon.es.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
7
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Poetarum Elegiacorum Testimonia Et Fragmenta, Pars Prior (Bibliotheca Scriptorum Graecorum Et Romanorum Teubneriana) (1998)
DE HC NWISBN: 9783598717017 bzw. 3598717016, in Deutsch, 2. Ausgabe, K.G. SAUR VERLAG, gebundenes Buch, neu.
Lieferung aus: Vereinigte Staaten von Amerika, zzgl. Versandkosten, Verandgebiet: DOM.
Von Händler/Antiquariat, Books From California, CA, Simi Valley, [RE:4].
Still Sealed in Plastic. Never used! As New Condition-Over 750, 000 Internet Orders Shipped. Hardcover, 2nd Updated ed.
Von Händler/Antiquariat, Books From California, CA, Simi Valley, [RE:4].
Still Sealed in Plastic. Never used! As New Condition-Over 750, 000 Internet Orders Shipped. Hardcover, 2nd Updated ed.
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Poetarum Elegiacorum Testimon CB 9783598717017 by Gentili/Prato, Book, BRAND NEW
DE NWISBN: 9783598717017 bzw. 3598717016, in Deutsch, Saur, München/Leipzig, Deutschland, neu.
Lieferung aus: Vereinigte Staaten von Amerika, Lieferart: Free, Lieferung: Deutschland, Artikelstandort: 60954 Vereinigte Staaten von Amerika, Versandkostenfrei.
Von Händler/Antiquariat, oodals_uk - Oodals UK.
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Von Händler/Antiquariat, oodals_uk - Oodals UK.
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